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Process Capability - TTIPCB

製程能力
  • 基板先完成線路蝕刻,進行鑽孔,電鍍,將基板上下層需要連接的電路予以導通連結,
  • 接著在基板上下各覆蓋1張樹脂與1張銅箔,再以熱壓方式將其固結為一體.
  • 此時做為基板內作為導通用的孔即為埋孔.
  • 貫孔: 上面的4層板完成後為了將第1層與第4層(也有可能包含2,3層)線路導通
  • 會以機械鑽孔方式依照指定位置鑽孔,再以電鍍方式導通各層,
  • 此導通用的孔即為貫孔,也叫貫穿孔或電鍍貫穿孔.
  • 塞孔: 有些產品,在貫穿孔上後續需要進行電鍍覆蓋(cap copper)會在熱壓過程
  • 中或者另外以油墨印刷方式,將孔塞滿,此被塞住的做法叫做塞孔.

Capability

2-12 Layer

6-18 Layer

Max.board thickness

78 mil (2.00 mm)

128 mil (3.2 mm)

Min.board thickness (2 layer board)

24 mil (0.6 mm)

12 mil (0.3 mm)

Min.board thickness (4 layer board)

24 mil (0.6 mm)

16 mil (0.3 mm)

Min.inner layer core thickness

4 mil (0.1 mm)

3 mil (0.08 mm)

Max.working panel

18” x 20” (457.2 x 508 mm)

18” x 20” (457.2 x 508 mm)

Max.inner layer copper thickness

1.0 oz

2.0 oz

Min.inner layer copper thickness

0.5 oz

0.3 oz

Max.outer layer copper thickness

2.0 oz

2.0 oz

Min.outer layer copper thickness

0.3 oz

NR

Min.mechanical drill size

10 mil (0.25 mm)

8 mil (0.2 mm)

Min.laser drill size

6 mil (0.15 mm)

4 mil (0.1 mm)

Aspect ratio

6.0/1.0

8.0/1.0

Outer layer line width / space

4 mil / 4 mil

3 mil / 3 mil

Inner layer line width / space

4 mil / 4 mil

3 mil / 3 mil

Min.SMT space

12 mil (0.3 mm)

12 mil (0.3 mm)

Min.BGA space

40 mil (1.0mm)

30 mil (0.75 mm)

Min.annular Ring

4 mil (0.1 mm)

4 mil (0.1 mm)

Min.solder mask printed width

4 mil (0.1 mm)

3 mil (0.08 mm)

Solder mask accuracy

± 3 mil (0.08 mm)

± 2 mil (.0.5 mm)

Surface treatment

Entek, ENIG, HASL , Gold Plating

Immersion Sliver, Tin, Entek + Gold

 

 

- Plating, ENIG + immersion Sliver, 

 

 

ENIG + Immersion Sliver

Punch control

± 6 mil (0.15 mm)

± 4 mil (0.1 mm)

V-Cut line control

± 16 mil (0.4 mm)

± 16 mil (0.4 mm)

Board thickness control

± 10 %

± 5 %

Board warp control

± 0.7 %

± 0.5 %

Impedance control

± 10 %

± 7 %